The present status and development trend of magnetron sputtering Ti target
DONG Ting- yi1,2,3, WAN Xiao- yong2,3, ZHANG Cheng1, HE Jin- jiang3, L Bao- guo1,2
1. Trillion Metals Co. ,Ltd. , Beijing 100088, China 2. GRIKIN Advanced Materials Co. ,Ltd. , Beijing 102200, China 3. The High Purity Metal Sputtering Target Engineering Technology Research Center in Beijing，Beijing 102200, China
Abstract：The classification，application and preparation situation of the magnetron sputtering Ti target are described，the several important questions about sputtering Ti target materials which have to be resolved at moment are pointed out，moreover the development trend of sputtering target materials is also discussed and prospected in this paper.
董亭义 ，万小勇 ，章程，何金江，吕保国 . 磁控溅射钛靶材的发展概述[J]. , 2017, 24(5): 57-62.
DONG Ting- yi,,, WAN Xiao- yong,, ZHANG Cheng, HE Jin- jiang, L Bao- guo,. The present status and development trend of magnetron sputtering Ti target. , 2017, 24(5): 57-62.
2017, Vol. 24 
